U.S. lawmakers scaled back a bill that would restrict Chinese chipmaking equipment to ensure narrower potential impact, Reuters reported Thursday, citing a draft bill.
The restrictions under the MATCH Act would still include countrywide restrictions on deep ultraviolet immersion lithography machines by Netherlands-based ASML, according to Reuters.
The bipartisan Multilateral Alignment of Technology Controls on Hardware, or MATCH, Act would help the U.S. keep its top position in artificial intelligence technology, according to the report.
An earlier draft would have forced allies to adhere to U.S. controls and imposed countrywide and company-tied restrictions, the report said.
Congress has been drafting new legislation on chip restrictions in line with President Donald Trunp's loosened curbs on advanced chips, Reuters said.
(Market Chatter news is derived from conversations with market professionals globally. This information is believed to be from reliable sources but may include rumor and speculation. Accuracy is not guaranteed.)